BCB-to-oxide bonding technology for 3D integration

نویسندگان

  • S. L. Lin
  • W. C. Huang
  • C. T. Ko
  • Kuan-Neng Chen
چکیده

Process optimization of BCB polymer to silicon oxide bonding was investigated. The suitable bonding temperature is about 300 C, while bond failure of BCB-to-oxide bonding is observed starting from 400 C. Bonding interface morphologies and bond strengths of BCB-to-oxide bonding were investigated as well. PECVD oxide to BCB bonding has better bonding quality than that of thermal oxide to BCB bonding. Si–O–Si bonds may be the reason of a strong BCB to oxide bonding. Water molecules link BCB and oxide surfaces during the initial contact, while Si–O–Si bonds are formed during bonding. This proposed mechanism of BCB-to-oxide bonding provides a guideline for polymer to oxide hybrid bonding technology in 3D integration. 2011 Elsevier Ltd. All rights reserved.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Via-First Inter-Wafer Vertical Interconnects utilizing Wafer-Bonding of Damascene-Patterned Metal/Adhesive Redistribution Layers

Three-dimensional (3D) integration with through-die vias offer improved electrical performance compared to edgeconnected wire bonds in stacked-die assemblies. Monolithic wafer-level 3D integration offers the potential for a high density of micron-sized through-die vias necessary for highest performance of integrated systems. In addition, such wafer-level technologies offer the potential of lowe...

متن کامل

Oxide-Oxide Thermocompression Direct Bonding Technologies with Capillary Self-Assembly for Multichip-to-Wafer Heterogeneous 3D System Integration

Plasmaand water-assisted oxide-oxide thermocompression direct bonding for a self-assembly based multichip-to-wafer (MCtW) 3D integration approach was demonstrated. The bonding yields and bonding strengths of the self-assembled chips obtained by the MCtW direct bonding technology were evaluated. In this study, chemical mechanical polish (CMP)-treated oxide formed by plasma-enhanced chemical vapo...

متن کامل

Heterogenous integration of InP/InGaAsP photodetectors onto ultracompact Silicon-on-Insulator waveguide circuits

We present the heterogeneous integration of InP/InGaAsP photodetectors onto ultracompact Silicon-onInsulator (SOI) waveguide circuits using benzocyclobutene (BCB) die to wafer bonding. This technology development enables the integration of a photonic interconnection layer on top of CMOS. Fabrication processes were optimized and the transfer of a passive Silicon-on-Insulator waveguide layer usin...

متن کامل

Reliability of key technologies in 3D integration

3D IC packaging offers miniaturization, high performance, low power dissipation, high density and heterogeneous integration. Through-silicon via (TSV) and bonding technologies are the key technologies of 3D IC, and the corresponding reliability has to be well evaluated and qualified before real production applications. This paper reviews the emerging 3D interconnection technologies in worldwide...

متن کامل

A 3D wideband package sol BCB technology for ti

This paper describes the works performed on a solution of packaging dedicated to 3D TR modules in the 2-20GHz frequency range. The proposed solution is based on a non hermetic architecture involving organic and BCB substrates. The studied key bricks relative to assembly, vertical interconnections, passives integration are described and results consecutive to electrical and environmental evaluat...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:
  • Microelectronics Reliability

دوره 52  شماره 

صفحات  -

تاریخ انتشار 2012